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High‑Stability 349 nm CW UV Laser


High‑stability 349 nm CW UV laser delivers >3 W output with <0.5% power stability & <0.05 nm linewidth. Featuring >90% beam ellipticity, compact footprint, low power consumption & easy integration. Ideal for wafer inspection, lithography, fluorescence, Raman spectroscopy & biomedicine. Click the link to download the datasheet. watch the video.