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355 nm Nanosecond Pulse Laser
355 nm nanosecond pulsed laser with power stability < 1%, excellent beam quality, ellipticity > 95%, M² < 1.1, and well-defined pulse shape with pulse width of approximately 5–10 ns (@ < 10 kHz). Laser repetition frequency and pulse energy are adjustable. The laser also supports synchronous pulse width output. It is suitable for applications including microcellular cutting, wafer micromachining, LCD repair, mass spectrometry, and fluorescence excitation. Click the link to download the datasheet. Watch the video.
Changchun New Industries Optoelectronics Technology Co., Ltd.
Address: No. 888 Jinhu Road, High-Tech Zone, Changchun, 130103, P.R.China
International Tel:+86-431-85603799
Email: sales@cnilaser.com
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